Asml duv stepper The high productivity and low cost of ownership allow capacity extensions in existing DUV stepper fabs as well. RIT Oct 15, 2020 · Operator training video for the ASML PAS 5500/300C DUV Wafer Stepper. Oct 7, 2025 · Stepper Recipes Back to Lithography Recipes. After coating DUV-42P ARC (Brewer Science, anti-reflection Jan 29, 2023 · Furthermore, mask-related and OPC software required to operate lithography tools is also engineered in the US. 2 micrometers with layer-to-layer registration better than 45 nanometers. View and Download ASML PAS 5500 user manual online. GCA I-Line (365nm) Steppers give ~500nm resolution with ≤100nm alignment ASML DUV (248nm) Stepper gives ~200nm resolution with alignment/stitching ≤ 20nm Drawback is the small field size – you can’t expose a whole wafer at one time, so filling a full-wafer with many different designs could require multiple reticles/masks. This will add system (mask-level) Alignment Marks & reticle barcodes on the outer edges. The ASML can print the PM Marks at locations specified by the user. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing. Stepper 1 and Stepper 2 are i-line systems with good piece handling capabilities. Jun 30, 1995 · PAS 5500/400 Step & Scan Alignment System from ASML this unit was the second step & scan system released by ASML. While the US certainly has options to make ASML comply with technology restrictions due to its high US-based technology content, the US has chosen the diplomatic route. The maximum field size on the wafer is 22x22mm. 25 µm without compromising the excellent imaging performance and high productivity. Can be transferred to other I-Line litho tools (Stepper, MLA etc. 15-μm applications and beyond. Rotation and alignment strategy. Nov 5, 2025 · ASML Stepper 3 Standard Operating Procedure Regular Procedures for ASML Deep-UV Stepper #3 From visible blue light to invisible extreme UV light, ASML’s lithography machines keep innovation in light and lasers moving forward. (a) Optical microscope image of the alignment marks for the ASML PAS5500/300C DUV stepper. ) and a programmable light source shaping system called AERIAL. Post exposure bake (PEB) is required for all of these photoresists. Aug 29, 2025 · Uses multiple DUV Flood exposure/develop cycles to create undercut. Click Photos to Enlarge Lens Field Size Overlay Jun 26, 2025 · "ASML PAS 5500/330" - this is for the 248nm DUV Stepper. Designed as a high-speed production unit. A stepper or wafer stepper is a device used in the manufacture of integrated circuits (ICs). The system is configured for 4” wafers. 1 General Description - The ASML PAS 5500/200 is a 5x reduction, i-line stepper set up for exposure of 6 inch wafers using 6 inch reticles. It has a 4X reduction lens with variable Numerical Aperture (N. The US, Japan, and the Netherlands have been hosting discussions to restrict China’s access to lithography The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. In deep ultraviolet (DUV) lithography systems, those components are lenses; in extreme ultraviolet (EUV) systems, they’re mirrors. Output is approximately 200mW/cm2 @248nm. Contact us now. The ASML /300C stepper uses 248nm illumination. 25 µm DUV wafer stepper, that has been developed for the mass production of the 256 M DRAM generation of chips. PAS 5500 shaped ASML’s market success and technology leadership – becoming our longest-lived lithography platform and one of our most versatile product lines. The system has 350nm resolution with a 0. Stepper incorporates an AERIAL Illuminator, which allows extendibility beyond 0. With models like PAS 2500/40, PAS 5500/300C, and PAS 5000/50, these analogues offer high precision and speed, ensuring superior quality and consistency in pattern transfer. Oct 10, 2025 · The ASML 5500 stepper is a 248nm (KrF) DUV stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm (with effort). Layer-to-layer overlay accuracy is better than 30nm. All lithography levels for a particular design are included in a single stepper job. System model number - ask the photomask vendor to Magnify and Insert your 1x wafer-scale designs into the appropriate stepper template for the model of Stepper you are using. One interesting difference is that the user does not need to include wafer marks in their pattern design. ASML PM Mark The alignment system used on the ASML stepper is somewhat different than that on the GCA tools. Read our history to learn how we've grown into the semiconductor industry leader we are today. Overlay capability is better than 50nm. Stepper. General photolithography training For the online part of general photolithography training, use See full list on epfl. ASML's history is rich with innovation and collaboration. 300nm+ features are relatively "easy" to resolve. ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip. ch Aug 19, 2025 · At Bridge Tronic Global, we have a 'ASML PAS 5500 / 300 C DUV Stepper (Deep Ultraviolet)' available for sale. Stepper 3 is a DUV (248nm) system primarily used for full 100mm wafers. ASML PAS 5500/300 248nm DUV Stepper ASML PAS 5500/300C is capable of processing 88 (200 mm) wafers per hour. 2. DUV resists do not work for i-line and i-line resists do not work for DUV. The PAS 5500/350C is a Deep UV stepper for 0. The PAS 5500/350C system provides a very cost-effective mix-and-match lithography solution when used in conjunction with other ASML PAS 5500 i-line and DUV steppers. S3. Please schedule training within a week of your first anticipated use. 11/30/22 Alignment Mark Locations: (If Needed) Nov 5, 2025 · ASML Stepper 3 Standard Operating Procedure Regular Procedures for ASML Deep-UV Stepper #3 The ASML PAS 5500/300C DUV Wafer Stepper is a late-1990’s tool using light from a 10W Krypton-Fluoride (KrF) excimer laser source. 4. Tool-specific training, online and in-person. General photolithography training, online and in-person. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible. 60 variable numerical aperture. Oct 10, 2025 · About General Capabilities/Overview The ASML 5500 stepper is a 248nm (KrF) DUV stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm (with effort). Job creation and editing training is in a separate video. A. A High Throughput DUV Wafer Stepper with Flexible Illumination Source J. . 1. General Photolithography training is required. Nov 8, 2022 · Reticle Barcode: “UCSBJAN2020” Make a SEPARATE Slide for Each Mask Plate Alignment Definition Specify exact coordinates of alignment marks to be placed by the stepper, and type of Alignment mark. ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip. 40-0. Fig. The US, Japan, and the Netherlands have been hosting discussions to restrict China’s access to lithography ASML's TWINSCAN XT:860N is designed using state-of-the-art optics for volume 200 and 300 mm wafer production at and below 110 nm resolution. This paper introduces a new high performance 0. PAS 5500 laboratory equipment pdf manual download. 57) and a resolution < 250 nm. It is an essential part of the process of photolithography, which creates millions of microscopic circuit elements on the surface of silicon wafers out of which chips are made. DUV means "deep ultraviolet light". The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm * wafer cassette processing capability. ASML’s innovations in lens and mirror design have allowed chipmakers to reduce the sizes of features on microchips. These resists are specific to DUV; any other resists or materials should not be used without Staff approval. 48-0. ASML PAS 5500/200 – Stepper – UCLA NanolabUCLA Nanolab The TWINSCAN XT:400L is ASML’s latest-generation i-line lithography system, using a mercury vapor lamp to print features down to 220 nm. ASML's PAS series of wafer steppers are renowned for their cutting-edge technology and innovation. Moreover, their advanced optics The ASML 300C DUV stepper uses a KrF excimer laser to expose features as small as 0. May 7, 2021 · May 9, 2021 marks 30 years since the first-ever PAS 5500 platform was shipped. Refurbished systems We refurbish ‘classic’ PAS 5500 and TWINSCAN lithography systems for a new life and a new purpose. Stepper features a variable NA (0. Download Table | Specifications of PAS 5500/300 DUV stepper from publication: A HIGH THROUGHPUT DUV WAFER STEPPER WITH FLEXIBLE ILLUMINATION SOURCE | | ResearchGate, the professional network for ASML is the leading supplier to the semiconductor industry, driving lithography system innovation to make chips smaller, faster and greener. Below is a listing of stepper lithography recipes. The ASML PAS 5500/300C DUV Wafer Stepper is a late-1990’s tool using light from a 10W Krypton-Fluoride (KrF) excimer laser source. The TWINSCAN XT:1460K is ASML's latest-generation dual-stage ‘dry’ lithography system, offering a 30% productivity increase over previous models. 57NA 250nm node: refractive optics: variable illumination! Off-axis illumination Jan 29, 2023 · Furthermore, mask-related and OPC software required to operate lithography tools is also engineered in the US. The system is designed for high throughput, so ASML PAS 5500/300C DUV Wafer Stepper Tool access requirements 1. Each component must be correctly positioned to within a nanometer to ensure image quality. Since the late 1980s, all our lithography systems have DUV lithography optics from ZEISS SMT can be used to manufacture microchip structures of 40 nanometers for the semiconductor industry. ) Updates to the process: You now only need to do 5min DUV Flood exposure each cycle (lamp optics were replaced) Use the new "101B" developer, which replaced the "SAL/101A" developers but works the same. This stepper is the first of a new Stepper Recipes Back to Lithography Recipes. They excel in automation and productivity, reducing cycle times and increasing throughput. Using 365nm near-UV light this stepper is capable of a minimum feature size of 450nm and alignment between lithographic layers of 90nm. Stoeldraijer, SEMICON Japan 6 • ASML 5500/300 4X scanner:248 nm KrF; 0. ja1 ku skih0 qsx7 mll9 10zg jbxod cbclnjl 3ca a11